A Global leader in electronics fabrication
Nippon Sanso Matheson, together with parent company Nippon Sanso Holdings Corporation, is one of the largest providers of gases and materials for electronics and semiconductor fabrication on the planet.
As a global leader among suppliers of gases and materials for semiconductor fabrication, Nippon Sanso Matheson is a sustainable source for your gas supply requirements. You can be confident that your gases are produced, purified, and packaged to world class quality and safety standards. Depend on Nippon Sanso Matheson not only for gases and materials, but for comprehensive site services as well.
Breadth of Gas Capabilities
Semiconductor manufacturing is complex. Trust us to make your supply chain easy with one call whatever electronic grade gas you need.
Manufacturers trust us to provide the widest breadth of electronic and semiconductor grade gases. As a global leader with an expansive international supply chain, Nippon Sanso Matheson is your comprehensive source for electronics and semiconductor specialty gases. From dopants and etchants to ion implantation and chemical vapor deposition (CVD), we are the primary manufacturer and/or supplier of:
- Arsine & Arsine Mixes
- Diborane & Diborane Mixes
- Phosphine & Phosphine Mixes
- Hydrocarbons (Propylene, Ethylene, Ethane, Methane)
- High Purity Halocarbons (CH₃F, SF₆, C₂F₆, CH₂F₂, CF₄, CHF₃, C₄F₈)
- Hydrogen Selenide
- Electronics Corrosive gases (BCl₃, Cl₂, HBr, DCS (SiH₂Cl₂), SiCl₄)
- Hydrogen Sulfide
- Disilane and Silane
- Carbon Monoxide (CO), Deuterium (D2)
- Super high purity inerts (N2, Ar, Helium, CO2)
- Atmospheric mixtures
But it’s not just the wide breadth of gases – we are able to provide custom mixes, higher purities and a variety of vessels to meet your needs, whether you are using tonners, pods, cylinders, or other systems. Our cylinder preparation and lab certification expertise is key to providing the highest purities available and to reducing variation cylinder to cylinder.
Semiconductor manufacturers trust Nippon Sanso Matheson when purity matters. Our best-in-class technology in hydride gases filling leads the industry, and is located within the United States.
We are a primary manufacturer, and the largest Synthesizer of Arsine in the World, with the Highest domestically available fill volumes. We have custom Packaging Options, and the Highest Purities available on the market. We invest in quality on these and other gases in the USA at our Semiconductor center of excellence. Partner with a vendor who can support your electronic and semiconductor grade gas needs- no matter what the gas.
Solutions Beyond Gases
Manufacturers trust our Electronics solutions beyond just gas.
As solution providers for semiconductor manufacturing, Nippon Sanso Matheson offers equipment systems for ultra-purification, UHP gas delivery, and precision UHP gas control.
Nippon Sanso Matheson’s Ultra-High Purity Equipment and Purification Technology Team is positioned to resolve the most challenging ultra-high purity gas management and purification requirements. Whether you require process gas modules or advanced turnkey process systems, Nippon Sanso Matheson will collaborate with you from concept, to prototype, to optimized production.
We design and manufacture custom equipment to solve the most challenging specialty gas requirements. Our core capabilities allow us to deliver prototype systems rapidly and ramp to production volume with high quality and throughput. Equipped with multiple large clean rooms, particle and TOC testing stations, and orbital/weld lathe capability, we offer unique gas delivery products ranging from process gas modules to advanced turnkey systems. We collaborate with you from concept and prototype to optimized production.
Our NANOCHEM® solutions deliver improved wafer resistivity, prevent corrosion when using highly corrosive materials (such as HBr) and maintain consistent operation at high flow rates. They effectively handle challenging applications, such as purifying HF and acetylene, and testing for sensitive gases like germane. They are also capable of identifying and removing complex impurities such as carbamates in NH3. Our sister company provides leading MOCVD technology- we are the only gas supplier in the US with an affiliate sister company that supplies MOCVD equipment. This gives us insights into critical application needs, and helps us stay on the leading edge of research. Whether you’re scaling a new fab or optimizing an existing line, we simplify complexity.
Emergency Response and Site Services
Our support goes beyond our walls. We support our semiconductor manufacturing customers at their locations. Through our Total Gas and Chemical Management Site Services, where our staff works full time at your location, to our emergency response team. We are there not only WHEN you need us, but WHERE you need us, and we can respond to such hazardous material incidents.
Our Research and Development Center
Nippon Sanso Matheson is innovating alongside you—developing next-generation gases and materials for tomorrow’s technologies.
Nippon Sanso Matheson’s R&D group at the Advanced Technology Center is innovating in cylinder surface treatments, UHP equipment, molecule delivery systems, purifiers, and abatement materials. To develop world-class products, we utilize state-of-the-art instrumentation and continuously innovate new analytical methods. We innovated the quantification of metals, hydrocarbons, and refractory chemical species down to part per quadrillion (PPQ) levels. Our efforts are energized through ongoing strategic alliances with key chip manufacturers, equipment OEMs, national labs, and universities to further enhance our development.
Search Semiconductor-grade Gases
| Formula | Gas Name | Specs |
|---|---|---|
| Ar | Argon | Cylinders |
| AsH3 | Arsine | Cylinders |
| AsH3 | Arsine Two-Component Mixture | Cylinders |
| B2H6 | Diborane Two-Component Mixture | Cylinders |
| BCl3 | Boron Trichloride | Cylinders |
| BF3 | Boron Trifluoride | Cylinders |
| C2F6 | Halocarbon 116 (Hexafluoroethane) | Cylinders |
| C2H4 | Ethylene | Cylinders |
| C2H6 | Ethane | Cylinders |
| C3F8 | Halocarbon 218 (Perfluoropropane) | Cylinders |
| C3H6 | Propylene | Cylinders |
| C4F8 | Halocarbon C318 (Octafluorocyclobutane) | Cylinders |
| C5F8 | Halocarbon 4110 (Octafluorocyclopentene) | Cylinders |
| CF4 | Halocarbon 14 (Carbon Tetrafluoride) (Tetrafluoromethane) | Cylinders |
| CH2F2 | Halocarbon 32 (Difluoromethane) | Cylinders |
| CH3F | Halocarbon 41 (Methyl Fluoride) | Cylinders |
| CH4 | Methane | Cylinders |
| CHF3 | Halocarbon 23 (Trifluoromethane) | Cylinders |
| Cl2 | Chlorine | Cylinders |
| CO | Carbon Monoxide | Cylinders |
| CO2 | Carbon Dioxide | Cylinders |
| COS | Carbonyl Sulfide | Cylinders |
| D2 | Deuterium | Cylinders |
| GeH4 | Germane | Cylinders |
| H2 | Hydrogen | Cylinders |
| H2S | Hydrogen Sulfide | Cylinders |
| H2Se | Hydrogen Selenide | Cylinders |
| HBr | Hydrogen Bromide | Cylinders |
| HCl | Hydrogen Chloride | Cylinders |
| He | Helium | Cylinders |
| HF | Hydrogen Fluoride | Cylinders |
| Kr | Krypton | Cylinders |
| N2 | Nitrogen | Cylinders |
| N2O | Nitrous Oxide | Cylinders |
| Ne | Neon | Cylinders |
| NF3 | Nitrogen Trifluoride | Cylinders |
| NH3 | Ammonia | Cylinders |
| NO | Nitric Oxide | Cylinders |
| O2 | Oxygen | Cylinders |
| PH3 | Phosphine | Cylinders |
| PH3 | Phosphine Two-Component Mixture | Cylinders |
| SF6 | Sulfur Hexafluoride | Cylinders |
| Si2H6 | Disilane | Cylinders |
| Si3H8 | Silcore | Cylinders |
| SiCl4 | Silicon Tetrachloride | Cylinders |
| SiH(CH3)3 | Trimethylsilane | Cylinders |
| SiH2Cl2 | Dichlorosilane | Cylinders |
| SiH3CH3 | Methyl Silane | Cylinders |
| SiH4 | Silane | Cylinders |
| SiH4 | Silane Two-Component Mixture | Cylinders |
| SiHCl3 | Trichlorosilane | Cylinders |
| WF6 | Tungsten Hexafluoride | Cylinders |
| Xe | Xenon | Cylinders |
Gas Purification
NANOCHEM® Gas Purifiers enable ultrapurification of gases used in wafer and semiconductor fabrication, including the removal of dopants and volatile metals.
More on NANOCHEM® Ultrapurification
Below is a list of gases we purify. If the gas material of interest to you does not appear in this list, please contact us:
| Gas | |
|---|---|
| Air | Air |
| Ar | Argon |
| Ar (weld) | Argon (welding) |
| AsH3 | Arsine |
| AsH3 | Arsine (1-10%) |
| BCl3 | Boron Trichloride |
| BF3 | Boron Trifluoride |
| C2F6 | Hexafluoroethane |
| C2H2 | Acetylene |
| C2H4 | Ethylene |
| C2H6 | Ethane |
| C3F6 | Hexafluoropropylene |
| C3F8 | Octafluoropropane |
| C3H6 | Propylene |
| C3H8 | Propane |
| C4F10 | Perfluorobutane |
| C4F6 | Hexafluorobutadiene |
| C4F8 | Octafluorocyclobutane |
| C4H10 | Butane |
| C4H10 | Isobutane |
| C4H8 | Butene |
| C5F8 | Octafluorocyclopentene |
| CCl2O | Phosgene |
| CCl4 | Carbon Tetrachloride |
| CDA | Clean Dry Air |
| CF4 | Carbon Tetrafluoride |
| CH2F2 | Difluoromethane |
| CH3Cl | Methyl Chloride |
| CH3SH | Methyl Mercaptan |
| CH3SiH3 | Monomethyl Silane |
| CH4 | Methane |
| CH3F | Methyl Fluoride |
| CHF3 | Trifluoromethane |
| Chlorocarbons | Chlorocarbons |
| Cl2 | Chlorine |
| CO | Carbon Monoxide |
| CO2 | Carbon Dioxide |
| COS | Carbonyl Sulfide |
| CS2 | Carbon Disulfide |
| Cyclo-hydrocarbons | Cyclo-hydrocarbons |
| D2 | Deuterium |
| Fluorocarbons | Fluorocarbons |
| GeCl4 | Germanium Tetrachloride |
| GeF4 | Germanium Tetrafluoride |
| GeH4 | Germane |
| GeH4 | Germane (1-10%) |
| H2 | Hydrogen |
| H2S | Hydrogen Sulfide |
| H2Se | Hydrogen Selenide |
| Halocarbons | Halocarbons |
| HBr | Hydrogen Bromide |
| HCl | Hydrogen Chloride |
| He | Helium |
| HF | Hydrogen Fluoride |
| Hydrocarbons | Hydrocarbons |
| Kr | Krypton |
| N2 | Nitrogen |
| N2O | Nitrous Oxide |
| Ne | Neon |
| NH3 | Ammonia |
| NO | Nitric Oxide |
| NO2 | Nitrogen Dioxide |
| O2 | Oxygen |
| O3 | Ozone |
| PH3 | Phosphine |
| PH3 | Phosphine (1-10%) |
| SF6 | Sulfur Hexafluoride |
| Si2H6 | Disilane |
| SiCl4 | Silicon Tetrachloride |
| SiClH3 | Monochlorosilane |
| SiCl2H2 | Dichlorosilane |
| SiCl3H2 | Trichlorosilane |
| SiF4 | Silicon Tetrafluoride |
| SiH3CH3 | Methyl Silane |
| SiH4 | Silane |
| SO2 | Sulfur Dioxide |
| Xe | Xenon |
UHP Gas Equipment
As solution providers for semiconductor manufacturing, Nippon Sanso Matheson offers equipment systems for ultra-purification, UHP gas delivery, and precision UHP gas control.
Nippon Sanso Matheson’s Ultra-High Purity Equipment and Purification Technology Team is positioned to resolve the most challenging ultra-high purity gas management and purification requirements.
Whether you require process gas modules or advanced turnkey process systems, Nippon Sanso Matheson will collaborate with you from concept, to prototype, to optimized production.
Partner with Nippon Sanso Matheson Today
When precision, reliability, and expertise matter, Nippon Sanso Matheson delivers. By choosing Nippon Sanso Matheson as your electronic gas supplier, you gain a partner committed to helping you achieve superior results and long-term operational success. Contact Nippon Sanso Matheson to learn how customized gas solutions can elevate your processes and drive your business forward.
